Design and Fabrication of A High Density Metal Microelectrode Array for Neural Recording
نویسندگان
چکیده
We report a new fabrication technique for realizing a high-density penetrating metal microelectrode array intended for acute multipleunit neural recordings. The microelectrode array consists of multiple metal (Permalloy, Ni80Fe20) shanks projecting from a silicon supporting bulk. Neuron recording sites are located at the tip of each shank. The average distance between recording sites is 50 μm. Each shank is comprised of two segments, for realizing both mechanical strength and tissue penetrating ability. A rear support segment is 6-mm long, 40-μm wide, and 30-μm thick. The front segment consists of a 250-μm-long and 6-μmthick tapered tip, with the width at its widest point being 15 μm. Electrical insulation to the microelectrode body is achieved by conformal coating of a thin film of Parylene-C. Multiple recording sites with precise opening sizes are defined by selectively removing Parylene-C from the electrode tips using photolithography and oxygen plasma etching.
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